DocumentCode
1143187
Title
High-power photoconductive semiconductor switches treated with amorphic diamond coatings
Author
Davanloo, Farzin ; Collins, Carl B. ; Agee, Forrest J.
Author_Institution
Center for Quantum Electron., Univ. of Texas, Richardson, TX, USA
Volume
30
Issue
5
fYear
2002
fDate
10/1/2002 12:00:00 AM
Firstpage
1897
Lastpage
1904
Abstract
The mechanical and semiconductor properties of amorphic diamond can be employed to improve the photoconductive semiconductor switch longevity by coating the switch cathode or anode areas or both. In this paper, issues concerning the switch longevity were studied by fabrication and testing the GaAs photoconductive switches treated with the amorphic diamond under different switch configurations, gap settings, and diamond coating thickness. The tunneling of electrons from amorphic diamond to GaAs during the off-state stage of operation provided preavalanche sites that diffused conduction current upon switch activation. A significant improvement in switch lifetime was demonstrated by testing the diamond-coated switch performance in a prototype pulser. Elementary processes involved in conduction of diamond treated switch and other design options such as coating of switch anode area are examined and discussed.
Keywords
III-V semiconductors; amorphous state; diamond; gallium arsenide; photoconducting switches; power semiconductor switches; protective coatings; pulsed power switches; tunnelling; GaAs photoconductive switches; GaAs-C; amorphic diamond coatings; conduction current; design options; diamond coating thickness; electron tunneling; fabrication; gap settings; high-power photoconductive semiconductor switches; mechanical properties; off-state stage; preavalanche sites; semiconductor properties; switch activation; switch anode area coating; switch cathode area coating; switch configurations; switch lifetime; switch longevity; Anodes; Cathodes; Coatings; Fabrication; Gallium arsenide; Mechanical factors; Photoconducting devices; Photoconductivity; Switches; Testing;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2002.805377
Filename
1178227
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