• DocumentCode
    1144535
  • Title

    Dual PE-CVD circulating fluidized bed reactor

  • Author

    Tap, Roland ; Willert-Porada, Monika

  • Author_Institution
    Fac. of Appl. Natural Sci., Univ. of Bayreuth, Germany
  • Volume
    32
  • Issue
    5
  • fYear
    2004
  • Firstpage
    2085
  • Lastpage
    2092
  • Abstract
    Fluidized bed reactors (FBR) are widely used in chemical engineering, as well as for raw materials processing because of the excellent heat and mass transfer in a fluidized bed. A new FBR was developed for plasma assisted synthesis and coating of granular solid materials by integration of the FBR simultaneously into two different microwave cavities: a microwave plasma cavity and a chemical vapor deposition (CVD) cavity, where microwave radiation is used to heat the granular material. With such a FBR, a systematic study of plasma activation of the granular material on the chemical reaction taking place at the surface of the granular material is possible. The interaction of the fluidized particles with the microwave field influences the ignition, as well as the stability of the microwave plasma significantly. As compared to a single stage CVD-FBR or a single stage plasma enhanced (PE-FBR) coating performance and process control is significantly improved by the newly developed dual-zone circulating PE-CVD-FBR.
  • Keywords
    fluidised beds; heat transfer; mass transfer; plasma CVD; plasma chemistry; plasma instability; plasma radiofrequency heating; plasma-beam interactions; chemical engineering; chemical reaction; chemical vapor deposition cavity; dual PECVD circulating fluidized bed reactor; granular solid material coating; heat transfer; mass transfer; microwave plasma cavity; microwave plasma ignition; microwave plasma stability; microwave radiation; particle-microwave field interaction; plasma activation; plasma assisted synthesis; plasma enhanced coating; Chemical engineering; Chemical vapor deposition; Coatings; Electromagnetic heating; Fluidization; Inductors; Plasma chemistry; Plasma materials processing; Plasma stability; Raw materials; Chemical vapor deposition; circulating fluidized bed reactors; coating granular materials; microwave plasma; plasma-enhanced PE-CVD;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2004.835969
  • Filename
    1347271