DocumentCode
1145854
Title
Numerical analysis of slow current transients and power compression in GaAs FETs
Author
Kazami, Yusuke ; Kasai, Daisuke ; Horio, Kazushige
Author_Institution
Fac. of Syst. Eng., Shibaura Inst. of Technol., Saitama, Japan
Volume
51
Issue
11
fYear
2004
Firstpage
1760
Lastpage
1764
Abstract
Two-dimensional transient simulation of GaAs MESFETs is performed when the gate voltage and the drain voltage are both changed abruptly. Quasi-pulsed current-voltage (I-V) curves are derived from the transient characteristics. It is discussed how the slow current transients (lag phenomena) and the pulsed I-V curves are affected by the existence of substrate traps and surface states. It is shown that the so-called power compression could occur both due to substrate traps and due to surface states. Effects of impact ionization of carriers on these phenomena are also discussed. It is shown that the lag phenomena and the power compression are weakened when impact ionization of carriers becomes important, because generated holes may help the traps to change their ionized densities quickly.
Keywords
III-V semiconductors; Schottky gate field effect transistors; electron traps; gallium arsenide; impact ionisation; semiconductor device models; substrates; surface states; transients; 2D transient simulation; GaAs; MESFET; drain lag; drain voltage; gate lag; gate voltage; impact ionization; lag phenomena; power compression; quasi-pulsed current-voltage curves; slow current transients; substrate traps; surface states; FETs; Gallium arsenide; HEMTs; Impact ionization; MESFETs; MODFETs; Numerical analysis; Substrates; Transient analysis; Voltage; Drain-lag; GaAs MESFET; gate-lag; impact ionization; power compression; substrate trap; surface state;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2004.837383
Filename
1347392
Link To Document