DocumentCode
1146883
Title
High-temperature DC characteristics of AlxGa0.52-x In0.48P/GaAs heterojunction bipolar transistors grown by metal organic vapor phase epitaxy
Author
Yow, Ho-Kwang ; Houston, Peter A. ; Ng, Chee-Mun Sidney ; Button, Christopher ; Roberts, John Stuart
Author_Institution
Dept. of Electron. & Electr. Eng., Sheffield Univ., UK
Volume
43
Issue
1
fYear
1996
fDate
1/1/1996 12:00:00 AM
Firstpage
2
Lastpage
7
Abstract
A series of AlxGa0.52-xIn0.48P/GaAs heterojunction bipolar transistors (HBT´s) with x=0 to x=0.52 showed ideality factors close to unity for both base current and collector current and small variation in gain with temperature up to at least T=623 K across the whole range of x composition. Hole current injection from the base into the emitter in these devices was shown to be negligible. The current gain, β, which is temperature insensitive was thought to be limited by bulk base recombination for x⩽0.3 and recombination at the graded emitter region for x>0.3. The optimum emitter composition (highest β, and good β stability with collector current and temperature) was found to be x=0.18-0.30. Useful transistor action with very high gain and output resistance is possible up to at least T=623 K, limited only by the thermal performance of the unoptimized ohmic contacts employed in the devices
Keywords
Auger effect; III-V semiconductors; aluminium compounds; electron-hole recombination; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; negative resistance; space charge; vapour phase epitaxial growth; 623 K; AlxGa0.52-xIn0.48P/GaAs; AlGaInP-GaAs; HBT; MOVPE; NDR; bulk base recombination; heterojunction bipolar transistors; high-temperature DC characteristics; hole current injection; metal organic vapor phase epitaxy; thermal performance; unoptimized ohmic contacts; Contact resistance; Doping; Epitaxial growth; Gallium arsenide; Heterojunction bipolar transistors; Performance gain; Space charge; Stability; Temperature; Thermal resistance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.477586
Filename
477586
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