• DocumentCode
    1147244
  • Title

    Dynamic characterization of a-Si TFT-LCD pixels

  • Author

    Aoki, Hitoshi

  • Author_Institution
    Hewlett-Packard Co., Palo Alto, CA, USA
  • Volume
    43
  • Issue
    1
  • fYear
    1996
  • fDate
    1/1/1996 12:00:00 AM
  • Firstpage
    31
  • Lastpage
    39
  • Abstract
    A dynamic analysis of an amorphous silicon (a-Si) Thin-Film-Transistor-Liquid-Crystal-Display (TFT-LCD) pixel is presented using new a-Si TFT model and new Liquid Crystal (LC) capacitance models for SPICE simulators. This analysis is useful to all Active Matrix LCD designers for evaluating and predicting the performance of LCD´s. The a-Si TFT model is developed to simulate important a-Si TFT characteristics such as off-leakage current, threshold voltage shift due to voltage stress and temperature, localized states behavior, and bias- and frequency-dependent gate to-source and gate-to-drain capacitance. In addition, the LC Capacitance model is developed using simplified empirical equations. The modeling procedure is useful to TFT and LCD designers who need to develop their own models. Since our experiments simulate critical TFT-LCD transient effects such as the voltage drop due to gate-to-source capacitance and dynamic off-leakage current, it is possible to accurately characterize TFT-LCD´s in the time domain. The analysis and models are applicable to today´s optical characterizations of Flat-Panel-Displays (FPD´s)
  • Keywords
    SPICE; amorphous semiconductors; capacitance; digital simulation; elemental semiconductors; flat panel displays; leakage currents; liquid crystal displays; semiconductor device models; silicon; thin film transistors; SPICE simulators; Si; TFT model; TFT-LCD pixels; active matrix LCD design; dynamic characterization; flat-panel-displays; gate-to-drain capacitance; gate-to-source capacitance; liquid crystal capacitance models; localized states behavior; off-leakage current; threshold voltage shift; time domain; voltage drop; Active matrix liquid crystal displays; Amorphous silicon; Analytical models; Capacitance; Performance analysis; SPICE; Stress; Temperature; Thin film transistors; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.477590
  • Filename
    477590