DocumentCode :
114766
Title :
Novel low-voltage RF-MEMS switch: Design and simulation
Author :
Ma Li Ya ; Soin, Norhayati ; Nordin, A.N.
Author_Institution :
Dept. of Electr. Eng., Univ. of Malaya, Kuala Lumpur, Malaysia
fYear :
2014
fDate :
27-29 Aug. 2014
Firstpage :
142
Lastpage :
145
Abstract :
This paper presents a novel design of a low-voltage radio frequency (RF) micro-electromechanical system (MEMS) switch with its electro-mechanical and microwave characteristics´ simulation, as well as its virtual fabrication process. The RF-MEMS switch employs a shunt capacitive structure. There are eight beams supporting a rectangular membrane to suspend over a coplanar waveguide (CPW) transmission line. The outer four crab-leg beams are used to bypass the signal line to the ground by the coupling capacitance and via when switch is actuated; and the inner four serpentine beams are used to supply the DC actuation voltage to the membrane. The developed RF-MEMS switch has a very low pull-in voltage of 3.53V; and the maximum von Mises stress under actuated condition is 13.1808MPa. The capacitance ratio of the switch is 218.5, with switch-on capacitance of 68fF. The switch´s microwave characteristics are obtained by AWR Design Environment 10® simulation; its insertion loss and isolation is -1.7532dB and -18.394dB respectively at 20GHz; and at frequency of 60GHz, the insertion loss is -7.2499dB and isolation is -27.293dB. A simple low-cost three-mask process with photoresist (PR-S1800) as sacrifice layer to release the membrane is proposed in this design; and a virtual fabricated device is simulated using IntelliFab v8.7® software.
Keywords :
beams (structures); coplanar waveguides; low-power electronics; microfabrication; microswitches; microwave switches; photoresists; yield stress; AWR Design Environment 10 simulation; CPW transmission line; DC actuation voltage; IntelliFab v8.7 software; PR-S1800; RF-MEMS switch; capacitance 68 fF; coplanar waveguide transmission line; coupling capacitance; crab-leg beams; electro-mechanical characteristic simulation; frequency 20 GHz; frequency 60 GHz; insertion loss; loss -1.7532 dB; loss -7.2499 dB; low-cost three-mask process; low-voltage RF-MEMS switch; low-voltage radiofrequency microelectromechanical system switch; maximum von Mises stress; microwave characteristic simulation; photoresist; pull-in voltage; rectangular membrane; sacrifice layer; serpentine beams; shunt capacitive structure; switch microwave characteristics; switch-on capacitance; switched capacitance ratio; virtual fabricated device; virtual fabrication process; voltage 3.53 V; Fabrication; Insertion loss; Microswitches; Radio frequency; Springs; Switching circuits; RF-MEMS; electrostatic; low-voltage; switch; virtual fabrication;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics (ICSE), 2014 IEEE International Conference on
Conference_Location :
Kuala Lumpur
Type :
conf
DOI :
10.1109/SMELEC.2014.6920816
Filename :
6920816
Link To Document :
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