• DocumentCode
    1148583
  • Title

    Ionic mobilities in liquid xenon

  • Author

    Hilt, O. ; Schmidt, W.F. ; Khrapak, A.G.

  • Author_Institution
    Hahn-Meitner-Inst., Berlin, Germany
  • Volume
    1
  • Issue
    4
  • fYear
    1994
  • fDate
    8/1/1994 12:00:00 AM
  • Firstpage
    648
  • Lastpage
    656
  • Abstract
    The drift mobility of positive ions of tetramethylsilane (TMSi) and of negative oxygen ions in liquid xenon was measured as a function of temperature from 161 K (triple point) to 205 K. The mobility of the TMSi+ ion is more than one order of magnitude lower than the intrinsic mobility of positive charge carriers (holes) in very pure liquid xenon. The positive ionic mobility is influenced by electrostrictive effects, which lead to the formation of solid layers of Xe atoms around the ion, and to a locally enhanced viscosity. A simple model for the cluster formation is discussed. Qualitative agreement is obtained over most of the temperature range, but serious deviations occur at the triple point. Another shortcoming of the model is the fact that it cannot explain the higher mobility of the negative oxygen ions
  • Keywords
    electrical conductivity of liquids; electrostriction; ion mobility; viscosity of liquids; xenon; 161 to 205 K; Xe; Xe-O2; cluster formation; drift mobility; electrostrictive effects; ionic mobilities; liquid xenon; negative oxygen ions; positive ions; solid layers; tetramethylsilane; triple point; viscosity; Charge carriers; Charge measurement; Current measurement; Electrodes; Electrons; Gases; Helium; Impurities; Temperature; Xenon;
  • fLanguage
    English
  • Journal_Title
    Dielectrics and Electrical Insulation, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1070-9878
  • Type

    jour

  • DOI
    10.1109/94.311708
  • Filename
    311708