DocumentCode :
114879
Title :
Characterisation of nickel germanide formed on amorphous and crystalline germanium
Author :
Algahtani, Fahid ; Pirogova, Elena ; Holland, Andrew ; Blackford, Mark ; McCallum, J.C. ; Johnson, Brett C.
Author_Institution :
Electr. & Comput. Eng, RMIT Univ., Melbourne, VIC, Australia
fYear :
2014
fDate :
27-29 Aug. 2014
Firstpage :
366
Lastpage :
369
Abstract :
Nickel germanide formed on amorphous and crystalline germanium is investigated for material and electrical properties. The crystal quality of films formed is poorer for the germanides formed on amorphous germanium with a slight increase in sheet resistance. The grains of NiGe formed on amorphous germanium show a growth that is hexagonal like, extending into the substrate further than germanides grains formed on crystalline germanium. The NiGe formed on crystalline germanium has a much more uniform thickness and uniform grain size and shape. Hollow cone illumination shows that some recrystallisation of the amorphised region of germanium does occur.
Keywords :
electrical resistivity; grain size; nickel compounds; recrystallisation; thin films; NiGe; amorphous germanium; crystal quality; crystalline germanium; electrical properties; grain size; hollow cone illumination; nickel germanide; recrystallisation; sheet resistance; thin films; Educational institutions; Germanium; Lighting; Nickel; Ohmic contacts; Substrates; Nickel germanide and crystalline germanide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics (ICSE), 2014 IEEE International Conference on
Conference_Location :
Kuala Lumpur
Type :
conf
DOI :
10.1109/SMELEC.2014.6920873
Filename :
6920873
Link To Document :
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