• DocumentCode
    1149524
  • Title

    Fabrication and modeling of high-frequency PZT composite thick film membrance resonators

  • Author

    Duval, Fabrice F C ; Dorey, Robert A. ; Wright, Robert W. ; Huang, Zhaorong ; Whatmore, Roger W.

  • Author_Institution
    Sch. of Ind. & Manuf. Sci., Cranfield Univ., Bedfordshire, UK
  • Volume
    51
  • Issue
    10
  • fYear
    2004
  • Firstpage
    1255
  • Lastpage
    1261
  • Abstract
    High-frequency, thickness mode resonators were fabricated using a 7 /spl mu/m piezoelectric transducer (PZT) thick film that was produced using a modified composite ceramic sol-gel process. Initial studies dealt with the integration of the PZT thick film onto the substrate. Zirconium oxide (ZrO/sub 2/) was selected as a diffusion barrier layer and gave good results when used in conjunction with silicon oxide (SiO/sub 2/) as an etch stop layer. Using these conditions, devices were produced and the acoustic properties measured and modeled. The resonators showed a resonant frequency of about 200 MHz, an effective electromechanical coupling coefficient of 0.34, and a Q factor of 22. Modeling was based on a Mason-type model that gave good agreement between the experimental data and the simulations. The latter showed, for the PZT thick film, an electromechanical coupling coefficient of 0.35, a stiffness of 8.65/sup */10/sup 10/ N.m/sup -2/ and an e/sub 33/,/sub f/ Piezoelectric coefficient of 9 cm/sup -2/.
  • Keywords
    Q-factor; composite materials; crystal resonators; dielectric losses; diffusion barriers; elastic constants; lead compounds; membranes; piezoelectric thin films; piezoelectric transducers; piezoelectricity; silicon compounds; sol-gel processing; thin film devices; zirconium compounds; 200 MHz; 7 micron; Mason-type modeling; PZT composite thick film membrance resonators; PZT composite thick film membrance transducers; PZT-ZrO/sub 2/-SiO/sub 2/; PbZrO3TiO3-ZrO2-SiO2; Q factor; acoustic properties; composite ceramic sol-gel process; dielectric losses; diffusion barrier layer; electromechanical coupling coefficient; etch stop layer; piezoelectric coefficient; resonant frequency; silicon oxide; stiffness; zirconium oxide; Acoustic devices; Acoustic measurements; Ceramics; Etching; Fabrication; Piezoelectric transducers; Silicon; Substrates; Thick films; Zirconium;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/TUFFC.2004.1350953
  • Filename
    1350953