DocumentCode
1149652
Title
Additional data on the effect of doping on the lasing characteristics of GaAs Alx Ga1-x As double-heterostructure lasers
Author
Pinkas, E. ; Miller, B.I. ; Hayashi, I. ; Foy, P.W.
Author_Institution
Israel Institute of Technology, Haifa, Israel
Volume
9
Issue
2
fYear
1973
fDate
2/1/1973 12:00:00 AM
Firstpage
281
Lastpage
282
Abstract
Lasing characteristics were measured for several double-heterostructure (DH) wafers with lower (
/cm3) and higher (
/cm3) carrier concentrations to those that were reported previously by Pinkas et al. The new data give additional support to the assumption that the major lasing-loss mechanism is the free carrier absorption.
/cm3) and higher (
/cm3) carrier concentrations to those that were reported previously by Pinkas et al. The new data give additional support to the assumption that the major lasing-loss mechanism is the free carrier absorption.Keywords
Absorption; Charge carrier processes; DH-HEMTs; Doping; Gallium arsenide; Impurities; Laboratories; Semiconductor lasers; Telephony;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1973.1077441
Filename
1077441
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