• DocumentCode
    1151878
  • Title

    Origin and characteristics of alpha-particle-induced permanent junction leakage

  • Author

    Takeuchi, Kan ; Shimohigashi, Katsuhiro ; Kozuka, Hirotsugu ; Toyabe, Toru ; Itoh, Kiyoo ; Kurosawa, H.

  • Author_Institution
    Hitachi Ltd., Tokyo, Japan
  • Volume
    37
  • Issue
    3
  • fYear
    1990
  • fDate
    3/1/1990 12:00:00 AM
  • Firstpage
    730
  • Lastpage
    736
  • Abstract
    The origin and characteristics of the permanent junction leakage caused by alpha-particle irradiation and its impact on the reliability of DRAM cells are investigated. The following results are obtained. (1) Three types of leakage are important in the alpha-particle-induced junction leakage current: the generation current that is mainly caused by divacancies (VV) induced in p-type substrates, the enhanced peripheral leakage current due to weak avalanche, and the peripheral leakage current caused by buildup of surface states. (2) The dominant component in the three types of leakage is determined by the reverse bias across the junction during both irradiation and measurements. (3) The hard error rates in the DRAM cell caused by the alpha-particle-induced junction leakage are strongly related to the alpha-particle-induced soft-error rates. As long as the DRAM cell is designed to provide high immunity to the soft errors, the hard errors are not a serious problem
  • Keywords
    alpha-particle effects; circuit reliability; integrated memory circuits; leakage currents; random-access storage; DRAM cells; alpha-particle-induced permanent junction leakage; enhanced peripheral leakage current; generation current; hard error rates; reliability; soft-error rates; surface states; Acceleration; Alpha particles; Current measurement; Degradation; Error analysis; Guidelines; Leakage current; Particle measurements; Random access memory; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.47779
  • Filename
    47779