Coupling and crosstalk between high speed interconnects in ultralarge scale integrated circuits

Author

Bandyopadhyay, Supriyo

Author_Institution

Dept. of Electr. Eng., Notre Dame Univ., IN, USA

Volume

28

Issue

6

fYear

1992

fDate

6/1/1992 12:00:00 AM

Firstpage

1554

Lastpage

1561

Abstract

The advent of sophisticated lithographic techniques has made it possible to fabricate densely packed ultra-large-scale-integrated (ULSI) circuits. In these chips, interconnect lines are so narrow and spaced in such close proximity that signal from one line could easily get coupled to another, causing interference and crosstalk. A general theory to model coupling between optical interconnects (waveguides) and quantum-mechanical coupling between narrow and very closely spaced silicide interconnects embedded in dielectrics (SiO₂) is presented

Keywords

VLSI; crosstalk; integrated circuit technology; integrated optoelectronics; metallisation; optical interconnections; SiO₂; coupling; crosstalk; dielectrics; general theory; high speed interconnects; interconnect lines; interference; nanotechnology; optical interconnects; quantum-mechanical coupling; silicide interconnects; sophisticated lithographic techniques; ultralarge scale integrated circuits; Coupling circuits; Crosstalk; Integrated circuit interconnections; Interference; Optical coupling; Optical interconnections; Optical waveguide theory; Optical waveguides; Quantum mechanics; Ultra large scale integration;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.135309

Filename

135309