DocumentCode :
1152902
Title :
High-Frequency ZnO Thin-Film Transistors on Si Substrates
Author :
Bayraktaroglu, Burhan ; Leedy, Kevin ; Neidhard, Robert
Author_Institution :
Air Force Res. Lab., AFRL/RYDD, Wright Patterson AFB, OH, USA
Volume :
30
Issue :
9
fYear :
2009
Firstpage :
946
Lastpage :
948
Abstract :
Record microwave frequency performance was achieved with nanocrystalline ZnO thin-film transistors fabricated on Si substrates. Devices with 1.2-mum gate lengths and Au-based gate metals had current and power gain cutoff frequencies of fT = 2.45 GHz and fmax = 7.45 GHz, respectively. Same devices had drain-current on/off ratios of 5 times1010 exhibited no hysteresis effects and could be operated at a current density of 348 mA/mm. The microwave performances of devices with 1.2- and 2.1- mum gate lengths and 50- and 100-mum gate widths were compared.
Keywords :
microwave transistors; silicon; substrates; thin film transistors; zinc compounds; Si; ZnO; current density; drain-current on/off ratios; frequency 2.45 GHz; frequency 7.45 GHz; high-frequency thin-film transistors; microwave performances; power gain; silicon substrates; size 1.2 mum; size 100 mum; size 2.1 mum; size 50 mum; FET; ZnO; high frequency; microwave; nanocrystalline; on/off ratio; pulsed laser deposition; thin-film transistors (TFTs);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2025672
Filename :
5175422
Link To Document :
بازگشت