Carbon and Tungsten Sputtering in a Helium Magnetron Discharge

Author

Tiron, Vasile ; Andrei, Codrin ; Nastuta, Andrei V. ; Rusu, George B. ; Vitelaru, Catalin ; Popa, Gheorghe

Author_Institution

Plasma Phys. Dept., Alexandru loan Cuza Univ., Iasi, Romania

Volume

37

Issue

8

fYear

2009

Firstpage

1581

Lastpage

1585

Abstract

This paper reports on carbon and tungsten deposition on a heated silicon substrate under He⁺ bombardment in a magnetron-sputtering device. The discharge was operated at constant pressure of 1.33 Pa for two discharge-current intensities (200 and 600 mA) and target power density up to 40 Wmiddotcm^-2. The deposited films were characterized by scanning electron microscopy, atomic force microscopy, and X-ray diffractometry. The topography and cross section revealed the influence of the target power density on the surface roughness, grains´ size, and thickness of the deposited films.

Keywords

X-ray diffraction; atomic force microscopy; carbon; grain size; ion beam effects; metallic thin films; plasma deposition; scanning electron microscopy; sputter deposition; surface roughness; tungsten; C; Si; W; X-ray diffractometry; atomic force microscopy; carbon sputtering; current 200 mA; current 600 mA; discharge-current intensity; film cross-section; film thickness; grain size; helium magnetron discharge; ion bombardment; magnetron-sputtering device; pressure 1.33 Pa; scanning electron microscopy; silicon substrate; surface roughness; surface topography; target power density; tungsten sputtering; Carbon; magnetrons; sputtering; tungsten;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2009.2024421

Filename

5175471