DocumentCode
1154445
Title
Giant magnetoresistance and antiferromagnetically coupled Co fraction in Co/Cu multilayers with varying number of periods
Author
van den Berg, H.A.M. ; Rupp, G.
Author_Institution
Corp. Res. & Dev., Siemens AG, Erlangen, Germany
Volume
30
Issue
2
fYear
1994
fDate
3/1/1994 12:00:00 AM
Firstpage
809
Lastpage
811
Abstract
The giant magnetoresistive signal of Co/Cu multilayers as a function of the number NCo of Co layers is experimentally investigated for Cu thicknesses of 1 nm, i.e. in the 1st antiferromagnetic maximum, and for Co layer thickness of 1 nm. The stacks were deposited by DC magnetron sputtering on an Fe buffer. The fraction FAF of the film that couples antiferromagnetically is derived from the hysteresis curves. A correction of FAF is required for the buffer and one Co layer. The FAF of stack periods close to the buffer is about 1, while FAF reduces at large stack thicknesses. The GMR of stacks with small thicknesses is limited by the diffuse scattering at the outer surfaces. The GMR of thicker stacks depends on FAF and the resistivity. Furthermore, the meaning of FAF is discussed. By optimizing N Co, we achieved Δρ/ρ´s as high as 72% at room temperature
Keywords
antiferromagnetic properties of substances; cobalt; copper; magnetic hysteresis; magnetic multilayers; magnetoresistance; sputtered coatings; 293 K; Co-Cu; Co/Cu multilayers; DC magnetron sputtering; Fe; Fe buffer; antiferromagnetic maximum; antiferromagnetically coupled Co fraction; diffuse scattering; giant magnetoresistance; hysteresis curves; resistivity; room temperature; stack periods; Antiferromagnetic materials; Conductivity; Couplings; Giant magnetoresistance; Hysteresis; Iron; Magnetic multilayers; Scattering; Sputtering; Temperature;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.312416
Filename
312416
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