DocumentCode
11545
Title
Metal Proportion Optimization of Annular Through-Silicon via Considering Temperature and Keep-Out Zone
Author
Xiangkun Yin ; Zhangming Zhu ; Yintang Yang ; Ruixue Ding
Author_Institution
Sch. of Microelectron., Xidian Univ., Xi´an, China
Volume
5
Issue
8
fYear
2015
fDate
Aug. 2015
Firstpage
1093
Lastpage
1099
Abstract
For annular through-silicon via (TSV)-based 3-D integrated circuits (3-D ICs), a greater TSV metal proportion of annular TSV leads to lower temperature but induces larger keep-out zone (KOZ). In this paper, the figure of merit (FOM) tradeoff model between temperature and KOZ is proposed to obtain the optimal metal proportion of annular TSV. First, the analytical models of the temperature of annular TSV-based 3-D IC and the KOZ induced by annular TSV are given, respectively, and both of them are verified by ANSYS software. Second, based on the analytical models, the FOM model is proposed. Then, the effects of total radius, material, and insertion density of annular TSV on FOM and optimal metal proportion are analyzed in detail. It is concluded that, the optimal metal proportion of annular TSV is approximately 0.3 with large ranges of the total radius and density of annular TSV, and various materials filled in annular TSV.
Keywords
optimisation; three-dimensional integrated circuits; 3D integrated circuits; ANSYS software; FOM tradeoff; annular through-silicon via; figure of merit tradeoff; keep-out zone; metal proportion optimization; optimal metal proportion; temperature zone; Analytical models; Finite element analysis; Integrated circuits; Metals; Silicon; Stress; Thermal stresses; 3-D integration; annular through-silicon via (TSV); keep-out zone (KOZ); temperature; temperature.;
fLanguage
English
Journal_Title
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
2156-3950
Type
jour
DOI
10.1109/TCPMT.2015.2446768
Filename
7156078
Link To Document