DocumentCode
1155555
Title
Minority-carrier transport parameters in n-type silicon
Author
Wang, Chin Hsin ; Misiakos, Konstantinos ; Neugroschel, Arnost
Author_Institution
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume
37
Issue
5
fYear
1990
fDate
5/1/1990 12:00:00 AM
Firstpage
1314
Lastpage
1322
Abstract
Minority-carrier diffusion length L , lifetime τ, and diffusion coefficient D in n-type Si are measured at 296 K in the doping range from 1018 cm-3 to 7×1019 cm-3. The measurement is based on a lateral collection of carriers generated by a spatially uniform light. The distance between the illumination edge and the collection junction is defined by photolithography. This allows simultaneous and independent determination of all transport parameters in the same material. A self-consistency and accuracy check is provided by the relation L 2=D τ. Details of experimental procedures are described. Empirical best-fit relations for the three parameters are given. The extraction of lifetime and diffusion coefficient was done in the frequency domain, which allows for straightforward elimination of parasitic effects in the nanosecond and subnanosecond range
Keywords
carrier lifetime; elemental semiconductors; minority carriers; photoconductivity; silicon; 296 K; Si; collection junction; frequency domain; illumination edge; lateral carrier collection; minority carrier diffusion coefficient; minority carrier diffusion length; minority carrier lifetime; n-type; nanosecond range; photocurrents; photolithography; spatially uniform light; subnanosecond range; transport parameters; Doping; Frequency domain analysis; Laser excitation; Length measurement; Lighting; Lithography; Photoconductivity; Silicon; Steady-state; Tail;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.108194
Filename
108194
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