DocumentCode :
1155555
Title :
Minority-carrier transport parameters in n-type silicon
Author :
Wang, Chin Hsin ; Misiakos, Konstantinos ; Neugroschel, Arnost
Author_Institution :
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume :
37
Issue :
5
fYear :
1990
fDate :
5/1/1990 12:00:00 AM
Firstpage :
1314
Lastpage :
1322
Abstract :
Minority-carrier diffusion length L, lifetime τ, and diffusion coefficient D in n-type Si are measured at 296 K in the doping range from 1018 cm-3 to 7×1019 cm-3. The measurement is based on a lateral collection of carriers generated by a spatially uniform light. The distance between the illumination edge and the collection junction is defined by photolithography. This allows simultaneous and independent determination of all transport parameters in the same material. A self-consistency and accuracy check is provided by the relation L 2=Dτ. Details of experimental procedures are described. Empirical best-fit relations for the three parameters are given. The extraction of lifetime and diffusion coefficient was done in the frequency domain, which allows for straightforward elimination of parasitic effects in the nanosecond and subnanosecond range
Keywords :
carrier lifetime; elemental semiconductors; minority carriers; photoconductivity; silicon; 296 K; Si; collection junction; frequency domain; illumination edge; lateral carrier collection; minority carrier diffusion coefficient; minority carrier diffusion length; minority carrier lifetime; n-type; nanosecond range; photocurrents; photolithography; spatially uniform light; subnanosecond range; transport parameters; Doping; Frequency domain analysis; Laser excitation; Length measurement; Lighting; Lithography; Photoconductivity; Silicon; Steady-state; Tail;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.108194
Filename :
108194
Link To Document :
بازگشت