DocumentCode :
1156492
Title :
2000-A/1-mΩ power MOSFETs in wafer repair technique
Author :
Stoisiek, Michael ; Schwarzbauer, Herbert ; Kiffe, Walter ; Theis, Dietmar
Author_Institution :
Siemens AG, Munich, West Germany
Volume :
37
Issue :
5
fYear :
1990
fDate :
5/1/1990 12:00:00 AM
Firstpage :
1397
Lastpage :
1401
Abstract :
Power MOSFETs with a current capability of up to several thousand amperes and hence an active device area significantly exceeding the typical IC chip size can be realized only if a wafer repair technique is used. A suitable technique has been developed and used to realize circular power MOSFETs with a diameter of 3 cm. The devices are suited to control up to 2000-A drain current and exhibit an on-resistance of RDS(on)=0.9 mΩ. To contact such a device, a pressure contact system adequate to the high-current value is used. Typical switching times are about 100 ns. Such a large-area MOSFET was used in a MOSFET-GTO (gate turnoff thyristor) cascode circuit to switch anode currents up to 1200 A/1000 V. The total switching time was significantly reduced, and a smaller snubber capacitor could be employed than with the GTO in a conventional circuit
Keywords :
insulated gate field effect transistors; power transistors; semiconductor switches; semiconductor technology; 1 mohm; 100 ns; 2000 A; 3 cm; MOSFET GTO cascode circuit; active device area; anode current switching; circular power MOSFETs; current capability; diameter; drain current; on-resistance; pressure contact system; snubber capacitor; switching times; wafer repair technique; Anodes; Contacts; MOS devices; MOSFET circuits; Snubbers; Switches; Switching circuits; Testing; Thyristors; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.108203
Filename :
108203
Link To Document :
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