Title :
High-performance carbon nanotube field-effect transistor with tunable polarities
Author :
Lin, Yu-Ming ; Appenzeller, Joerg ; Knoch, Joachim ; Avouris, Phaedon
Author_Institution :
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Abstract :
State-of-the-art carbon nanotube field-effect transistors (CNFETs) behave as Schottky-barrier-modulated transistors. It is known that vertical scaling of the gate oxide significantly improves the performance of these devices. However, decreasing the oxide thickness also results in pronounced ambipolar transistor characteristics and increased drain leakage currents. Using a novel device concept, we have fabricated high-performance enhancement-mode CNFETs exhibiting n- or p-type unipolar behavior, tunable by electrostatic and/or chemical doping, with excellent OFF-state performance and a steep subthreshold swing (S=63 mV/dec). The device design allows for aggressive oxide thickness and gate-length scaling while maintaining the desired device characteristics.
Keywords :
Schottky gate field effect transistors; carbon nanotubes; leakage currents; nanoelectronics; nanotube devices; reviews; C; Schottky-barrier-modulated transistors; ambipolar transistor characteristics; chemical doping; device characteristics; device design; drain leakage currents; electrostatic doping; gate oxide thickness; gate-length scaling; high-performance enhancement-mode CNFETs; n-type unipolar behavior; off-state performance; p-type unipolar behavior; state-of-the-art carbon nanotube field-effect transistor; steep subthreshold swing; tunable polarities; CNTFETs; Carbon nanotubes; Doping; Electrodes; Electrostatics; Leakage current; Schottky gate field effect transistors; Semiconductivity; Substrates; Voltage; Carbon nanotube; Schottky barrier (SB); doping; field-effect transistor;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2005.851427