Title :
Optimization of transient temperature uniformity in RTP systems
Author :
Norman, Stephen A.
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., CA, USA
fDate :
1/1/1992 12:00:00 AM
Abstract :
Independent, dynamic control of multiple lamps in a rapid thermal processing (RTP) system is a potential solution to the problem of transient wafer temperature nonuniformity. The author addresses the problem of minimizing temperature error during transients when independent control of lamp power settings is available. He presents a technique based on linear programming for minimization of worst case error during temperature trajectory following, given a model of an axisymmetric, multilamp RTP system
Keywords :
incoherent light annealing; integrated circuit manufacture; linear programming; minimisation; semiconductor technology; temperature control; temperature distribution; RTP systems; axisymmetric multilamp RTP; dynamic control; linear programming; minimization; multiple lamps; thermal model; transient temperature uniformity; Doping; Epitaxial growth; Impurities; Rapid thermal processing; Rough surfaces; Silicon; Stress; Surface morphology; Surface roughness; Temperature;
Journal_Title :
Electron Devices, IEEE Transactions on
