DocumentCode
1159424
Title
Optimization of transient temperature uniformity in RTP systems
Author
Norman, Stephen A.
Author_Institution
Dept. of Electr. Eng., Stanford Univ., CA, USA
Volume
39
Issue
1
fYear
1992
fDate
1/1/1992 12:00:00 AM
Firstpage
205
Lastpage
207
Abstract
Independent, dynamic control of multiple lamps in a rapid thermal processing (RTP) system is a potential solution to the problem of transient wafer temperature nonuniformity. The author addresses the problem of minimizing temperature error during transients when independent control of lamp power settings is available. He presents a technique based on linear programming for minimization of worst case error during temperature trajectory following, given a model of an axisymmetric, multilamp RTP system
Keywords
incoherent light annealing; integrated circuit manufacture; linear programming; minimisation; semiconductor technology; temperature control; temperature distribution; RTP systems; axisymmetric multilamp RTP; dynamic control; linear programming; minimization; multiple lamps; thermal model; transient temperature uniformity; Doping; Epitaxial growth; Impurities; Rapid thermal processing; Rough surfaces; Silicon; Stress; Surface morphology; Surface roughness; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.108233
Filename
108233
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