Title :
Millimeter-wave high-power 0.25-μm gate-length AlGaN/GaN HEMTs on SiC substrates
Author :
Schwindt, R.S. ; Kumar, Vipin ; Kuliev, A. ; Simin, G. ; Yang, J.W. ; Khan, Muhammad Asad ; Muir, M.E. ; Adesida, I.
Author_Institution :
Micro & Nanotechnology Lab., Univ. of Illinois, Urbana, IL, USA
fDate :
3/1/2003 12:00:00 AM
Abstract :
Reports on the CW power performance at 20 and 30 GHz of 0.25 μm × 100 μm AlGaN/GaN high electron mobility transistors (HEMTs) grown by MOCVD on semi-insulating SiC substrates. The devices exhibited current density of 1300 mA/mm, peak dc extrinsic transconductance of 275 mS/mm, unity current gain cutoff (fT) of 65 GHz, and maximum frequency of oscillation (fmax) of 110 GHz. Saturated output power at 20 GHz was 6.4 W/mm with 16% power added efficiency (PAE), and output power at 1-dB compression at 30 GHz was 4.0 W/mm with 20% PAE. This is the highest power reported for 0.25-μm gate-length devices at 20 GHz, and the 30 GHz results represent the highest frequency power data published to date on GaN-based devices.
Keywords :
III-V semiconductors; aluminium compounds; current density; gallium compounds; microwave field effect transistors; millimetre wave field effect transistors; power HEMT; wide band gap semiconductors; 0.25 micron; 110 GHz; 16 percent; 20 to 30 GHz; 30 GHz; 65 GHz; AlGaN-GaN; AlGaN/GaN; CW power performance; HEMTs; current density; maximum frequency of oscillation; output power; peak dc extrinsic transconductance; power added efficiency; saturated output power; unity current gain cutoff; Aluminum gallium nitride; Current density; Gallium nitride; HEMTs; MOCVD; MODFETs; Millimeter wave transistors; Power generation; Silicon carbide; Transconductance;
Journal_Title :
Microwave and Wireless Components Letters, IEEE
DOI :
10.1109/LMWC.2003.810115