Title :
Fabrication and Application of Ruthenium-Doped Titanium Dioxide Films as Electrode Material for Ion-Sensitive Extended-Gate FETs
Author :
Chou, Jung-Chuan ; Chen, Cheng-Wei
Author_Institution :
Grad. Sch. of Optoelectron., Nat. Yunlin Univ. of Sci. & Technol., Douliou
fDate :
3/1/2009 12:00:00 AM
Abstract :
A novel ruthenium-doped titanium dioxide (TiO2: Ru) film for pH detection is based on an ion-sensitive extended gate field effect transistor (ISEGFET) sensor. For the preparation of the TiO2:Ru sensing film, a specific processing for metal modification of TiO2 thin film is deposited by a co-sputtering system. After thermal annealing treatment, material analysis of the sensing layer is measured by SEM, Hall measurement system and electrical detection system. The average sensitivity of TiO2:Ru for hydrogen ion detection is about 55.20 mV/pH (concentration range between pH1 and pH13). The effect of long-term drift for TiO2:Ru ISEGFET-based sensor is presented. Drift rate of the sensor for pH is 0.745 mV/h for 12 h. In order to prepare the calcium ion sensor, the sensing membrane of polymer materials is based on TiO2: Ru ISEGFET-based sensor by physical adsorption. The average sensitivity of the calcium ion sensor in the concentration ranging between 1 M and 1times10-3 M CaCl2 is about 29.65 mV/pCa.
Keywords :
annealing; calcium; electrochemical electrodes; electrochemical sensors; hydrogen; ion sensitive field effect transistors; pH measurement; ruthenium; sputtered coatings; thin film sensors; titanium compounds; Ca; H2; Hall measurement system; ISEGFET sensor; SEM; TiO2:Ru; calcium ion sensor; co-sputtering system; electrical detection system; electrode material; hydrogen ion detection; ion-sensitive extended-gate FET; metal modification; pH detection; physical adsorption; polymer materials; ruthenium-doped titanium dioxide film; thermal annealing treatment; time 12 h; Annealing; Calcium; Electric variables measurement; Electrodes; FETs; Fabrication; Gas detectors; Hydrogen; Sputtering; Titanium; Calcium ion sensor; co-sputtering system; ion-sensitive extended gate field effect transistor (ISEGFET); ruthenium-doped titanium dioxide;
Journal_Title :
Sensors Journal, IEEE
DOI :
10.1109/JSEN.2008.2012221