• DocumentCode
    1166529
  • Title

    High-power and high-temperature operation of Mg-doped AlGaInP-based red laser diodes

  • Author

    Onishi, Toshikazu ; Inoue, Kenichi ; Onozawa, Kazutoshi ; Takayama, Toru ; Yuri, Masaaki

  • Author_Institution
    Semicond. Res. Center, Matsushita Electr. Ind. Co. Ltd., Kyoto, Japan
  • Volume
    40
  • Issue
    12
  • fYear
    2004
  • Firstpage
    1634
  • Lastpage
    1638
  • Abstract
    This paper reports on high-power and high-temperature operation of an AlGaInP-based high-power red laser diode with magnesium (Mg)-doped quaternary-alloy cladding layer. The use of Mg dopant with small diffusion coefficient enables abrupt doping profiles as well as high carrier concentrations when compared to conventional zinc (Zn) dopant. It was also found that the metal-organic vapor phase epitaxial (MOVPE) growth of Mg-doped quaternary AlGaInP alloy is not affected by so-called reactor memory effects, while unintentional incorporation of Mg is observed in GaAs after the growth of Mg-doped GaAs layers. The higher carrier concentration in the p-type cladding layer enhanced carrier confinement in the active layer so that device performance at high temperature is improved. The abrupt doping profile suppressing dopant diffusion into the active layer eliminates the nonradiative recombination in the active layer resulting in higher external quantum efficiency. The characteristic temperature of the Mg-doped red laser with a lasing wavelength of 659 nm is as high as 167 K while the Zn-doped laser exhibits a temperature of 127 K. High kink-free output power of 150 mW is achieved at 75°C.
  • Keywords
    III-V semiconductors; aluminium compounds; claddings; diffusion; doping profiles; gallium arsenide; gallium compounds; indium compounds; magnesium; semiconductor doping; semiconductor lasers; vapour phase epitaxial growth; 150 mW; 167 K; 659 nm; 75 degC; AlGaInP-based laser diode; AlGaInP:Mg; GaAs:Mg; Mg dopant; Mg-doped GaAs layers; Mg-doped red laser diode; carrier concentrations; diffusion coefficient; dopant diffusion; doping profiles; enhanced carrier confinement; external quantum efficiency; high-power operation; high-temperature operation; kink-free output power; metal-organic vapor phase epitaxial growth; nonradiative recombination elimination; p-type cladding; quaternary-alloy cladding; reactor memory effects; Diode lasers; Doping profiles; Epitaxial growth; Epitaxial layers; Gallium arsenide; Inductors; Magnesium; Power lasers; Temperature; Zinc; 65; Doping; gallium compounds; indium compounds; phosphorus compounds; semiconductor lasers;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.2004.837323
  • Filename
    1359970