• DocumentCode
    1167453
  • Title

    Destruction of Chlorodifluoromethane (\\hbox {CHF}_{2} \\hbox {Cl}) by Using Dielectric Barrier Discharge Plasma

  • Author

    Mok, Young Sun ; Lee, Sang-Baek ; Chang, Myung Shik

  • Author_Institution
    Dept. of Chem. Eng., Cheju Nat. Univ., Jeju
  • Volume
    37
  • Issue
    3
  • fYear
    2009
  • fDate
    3/1/2009 12:00:00 AM
  • Firstpage
    449
  • Lastpage
    455
  • Abstract
    The destruction of chlorodifluoromethane (CHF2Cl) was studied in a nonthermal atmospheric pressure plasma reactor with a perforated dielectric barrier, which is capable of producing intense streamers without significant pressure drop across the reactor. The performance of the dielectric barrier discharge reactor was evaluated with the parameters including oxygen content, input power, feed-gas flow rate, and initial CHF2Cl concentration. It was found that the reactive species from N2 mainly contributed to the destruction of CHF2Cl rather than those from oxygen and that the destruction efficiency largely decreased as the oxygen content increased. The change in the initial concentration did not nearly affect the destruction efficiency, which can partly be explained by the secondary destruction mechanism. The principle byproducts were identified using Fourier transform infrared spectroscopy, and chemical mechanisms were proposed for the destruction processes. According to the proposed mechanisms, COF2 was found to act as the key intermediate destruction product to convert CHF2Cl into CO2 and CO.
  • Keywords
    Fourier transform spectra; chemical reactors; discharges (electric); dissociation; infrared spectra; organic compounds; plasma chemistry; spectrochemical analysis; CO; CO2; COF2; DBD plasma; Fourier transform infrared spectroscopy; air reactive species; chemical mechanisms; chlorodifluoromethane destruction; dielectric barrier discharge; intense streamer production; nonthermal atmospheric pressure plasma reactor; perforated dielectric barrier; secondary destruction mechanism; Atmospheric pressure plasma reactor; chlorodifluoromethane; dielectric barrier;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.2011800
  • Filename
    4785523