• DocumentCode
    1170335
  • Title

    Lithography and the Future of Moore's Law, Copyright 1995 IEEE. Reprinted with permission. Proc. SPIE Vol. 2437, pp. 2–17

  • Author

    Moore, Gordon E.

  • Author_Institution
    Co-founder Intel Corporation
  • Volume
    11
  • Issue
    5
  • fYear
    2006
  • Firstpage
    37
  • Lastpage
    42
  • Abstract
    Semiconductor technology has made its great strides as a result of ever increasing complexity of the products produced exploiting higher and higher density to a considerable extent the result of progress in lithography. This article reviews the history and past performance of Moore´s Law relative to predictions and shows where the advances have come from.
  • Keywords
    Charge coupled devices; Complexity theory; Industries; Integrated circuits; International Electron Devices Meeting; Random access memory; Transistors;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits Society Newsletter, IEEE
  • Publisher
    ieee
  • ISSN
    1098-4232
  • Type

    jour

  • DOI
    10.1109/N-SSC.2006.4785861
  • Filename
    4785861
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1170335