DocumentCode :
1170911
Title :
Single-mode low-loss buried optical waveguide bends in GaInAsP/InP fabricated by dry etching
Author :
Singh, J. ; Henning, H. ; Harlow, M. ; Cole, S.
Author_Institution :
British Telecom Res. Labs., Ipswich, UK
Volume :
25
Issue :
14
fYear :
1989
fDate :
7/6/1989 12:00:00 AM
Firstpage :
899
Lastpage :
900
Abstract :
Low-loss single-mode buried optical waveguide bends in MOVPE-grown InP-based materials are reported. Reactive ion etching (RIE) was used to fabricate the curves which were subsequently buried in InP to reduce optical losses and to control the number of lateral guided modes. Losses as low as 1.1 dB for 200 mu m radius of curvature and 0.3 dB for 300 mu m radius of curvature have been measured using TE-polarised light at 1.553 mu m wavelength.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; integrated optics; optical interconnections; optical waveguide components; sputter etching; vapour phase epitaxial growth; 1.1 to 0.3 dB; 1.553 micron; 200 to 300 micron; GaInAsP-InP; MOVPE; RIE; TE-polarised light; dry etching; low-loss buried optical waveguide bends; optical losses; radius of curvature; reactive ion etching; single-mode buried optical waveguide bends; wavelength;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19890603
Filename :
31926
Link To Document :
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