Title :
A standardized method for CMOS unit process development
Author_Institution :
Hewlett-Packard Corp., Palo Alto, CA, USA
fDate :
5/1/1992 12:00:00 AM
Abstract :
The multipurpose mask set described, which consists of three stepper reticles, contains 95% of all test structures required for CMOS process development and random defect detection, thereby dramatically reducing the stepper reticle inventory and the frequency of reticle changes. Realizing the mask set by two dozen standard unit processes minimizes the feedback loop for defect density data, parametric data and unit process data
Keywords :
CMOS integrated circuits; integrated circuit manufacture; masks; CMOS process development; CMOS unit process development; multipurpose mask set; random defect detection; standard unit processes; standardized method; stepper reticles; test structures; CMOS process; Circuit testing; Dielectrics; Fabrication; Feedback loop; Lithography; Manufacturing processes; Process control; Standards development; Very large scale integration;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
