DocumentCode :
1172178
Title :
Impact ionization in thin silicon diodes
Author :
Agarwal, P. ; Goossens, M.J. ; Zieren, V. ; Aksen, E. ; Slotboom, J.W.
Author_Institution :
Philips Res., Leuven, Belgium
Volume :
25
Issue :
12
fYear :
2004
Firstpage :
807
Lastpage :
809
Abstract :
We study the breakdown behavior of thin, abrupt silicon pin-diodes, using a low-power optical technique which can directly measure the avalanche multiplication factors even in the presence of large tunneling currents. Our measurements agree with a simple model for nonlocal avalanche generation, and we use this model to extend the breakdown predictions to a broad class of doped diodes similar to those found in the base-collector region of bipolar devices. Based on this analysis, we make quantitative estimates for the BVCEO breakdown of modern Si and SiGe high-speed bipolar transistors.
Keywords :
avalanche diodes; bipolar transistors; low-power electronics; silicon compounds; BVceo breakdown; SiGe; avalanche multiplication factors; bipolar devices; breakdown behavior; breakdown predictions; doped diodes; high-speed bipolar transistors; impact ionization; large tunneling currents; low-power optical technique; nonlocal avalanche generation; photodiodes; quantitative estimates; thin abrupt silicon pin-diodes; thin silicon diodes; Avalanche breakdown; Current measurement; Diodes; Electric breakdown; Germanium silicon alloys; High speed optical techniques; Impact ionization; Predictive models; Silicon germanium; Tunneling; 65; Avalanche breakdown; bipolar transistors; photodiodes;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2004.838557
Filename :
1362782
Link To Document :
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