Title :
Capacitance Oscillations in Cylindrical Nanowire Gate-All-Around MOS Devices at Low Temperatures
Author :
Chin, S.K. ; Ligatchev, V.
Author_Institution :
Inst. of High Performance Comput., Singapore
fDate :
4/1/2009 12:00:00 AM
Abstract :
The effects of strong transverse confinement on cylindrical nanowire (NW) gate-all-around MOS are studied using a Schrodinger-Poisson simulator with full-quantum treatment. This letter is the first to show numerically that the gate capacitance oscillates toward the geometric limit as the gate voltage increases in the inversion regime for a n-type NW MOS; such oscillations are observed at a low temperature range of 5 K-38 K for an NW radius of 5-8 nm. These oscillating capacitance-voltage characteristics are the direct results of the severe nonuniformity of the electron density of states. In contrast to previous works that used semiclassical or quantum correction approaches, this letter demonstrates that full-quantum treatment is needed to observe these capacitance oscillations.
Keywords :
MIS devices; Schrodinger equation; capacitance; nanowires; oscillations; Schrodinger-Poisson simulator; capacitance oscillations; cylindrical nanowire gate-all-around MOS devices; full-quantum treatment; oscillating capacitance-voltage characteristics; temperature 5 K to 38 K; transverse confinement; Gate all around; MOS; Schrodinger–Poisson (SP); nanowire (NW);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2009.2013975