• DocumentCode
    1173288
  • Title

    26-GHz etched-groove silicon permeable base transistor

  • Author

    Gruhle, A. ; Badoz, P.A.

  • Author_Institution
    CNET, Meylan, France
  • Volume
    12
  • Issue
    10
  • fYear
    1991
  • Firstpage
    556
  • Lastpage
    558
  • Abstract
    A report is presented on the fabrication of etched-groove silicon permeable base transistors (PBTs) that reveal a maximum frequency of oscillation and a unity-current-gain cutoff frequency of 26 GHz, the latter being the highest value yet reported for Si PBTs. This performance was achieved with mushroom-shaped source fingers, a structure that permits both the passivation of the Si finger sidewalls and the reinforcement of the platinum gate with a gold overlayer. The doping distribution was optimized with two-dimensional numerical simulations, parasitic capacitances were reduced using a multilayer polyimide structure, and deep-UV optical lithography was used to fabricate PBTs with 0.2- to 0.4- mu m finger widths.<>
  • Keywords
    bipolar transistors; elemental semiconductors; passivation; silicon; solid-state microwave devices; 0.2 to 0.4 micron; 26 GHz; Pt gate; SHF; Si; deep-UV optical lithography; doping distribution; etched groove PBT; fabrication; finger widths; maximum frequency of oscillation; multilayer polyimide structure; mushroom-shaped source fingers; parasitic capacitances; passivation; permeable base transistor; semiconductors; two-dimensional numerical simulations; unity-current-gain cutoff frequency; Cutoff frequency; Doping; Etching; Fabrication; Fingers; Gold; Numerical simulation; Passivation; Platinum; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.119187
  • Filename
    119187