DocumentCode :
1173288
Title :
26-GHz etched-groove silicon permeable base transistor
Author :
Gruhle, A. ; Badoz, P.A.
Author_Institution :
CNET, Meylan, France
Volume :
12
Issue :
10
fYear :
1991
Firstpage :
556
Lastpage :
558
Abstract :
A report is presented on the fabrication of etched-groove silicon permeable base transistors (PBTs) that reveal a maximum frequency of oscillation and a unity-current-gain cutoff frequency of 26 GHz, the latter being the highest value yet reported for Si PBTs. This performance was achieved with mushroom-shaped source fingers, a structure that permits both the passivation of the Si finger sidewalls and the reinforcement of the platinum gate with a gold overlayer. The doping distribution was optimized with two-dimensional numerical simulations, parasitic capacitances were reduced using a multilayer polyimide structure, and deep-UV optical lithography was used to fabricate PBTs with 0.2- to 0.4- mu m finger widths.<>
Keywords :
bipolar transistors; elemental semiconductors; passivation; silicon; solid-state microwave devices; 0.2 to 0.4 micron; 26 GHz; Pt gate; SHF; Si; deep-UV optical lithography; doping distribution; etched groove PBT; fabrication; finger widths; maximum frequency of oscillation; multilayer polyimide structure; mushroom-shaped source fingers; parasitic capacitances; passivation; permeable base transistor; semiconductors; two-dimensional numerical simulations; unity-current-gain cutoff frequency; Cutoff frequency; Doping; Etching; Fabrication; Fingers; Gold; Numerical simulation; Passivation; Platinum; Silicon;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.119187
Filename :
119187
Link To Document :
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