DocumentCode :
1173308
Title :
The role of an amorphous SiC:H ´buffer´ in the high-performance mu c-SiC:H/a-SiC:H/poly-Si heterojunction solar cells
Author :
Hirata, G.A. ; Nishimoto, T. ; Matsumoto, Y. ; Okamoto, H. ; Hamakawa, Y. ; Farias, M.H. ; Cota-Araiza, L.
Volume :
12
Issue :
10
fYear :
1991
Firstpage :
562
Lastpage :
564
Abstract :
High-efficiency solar cells have been developed using relatively simple processing at low temperatures up to 300 degrees C. The cells studied were p/sup +/ mu c-SiC:H/p a-SiC:H (buffer)/n poly-Si and n/sup +/ mu c-SiC:H/n a-SiC:H (buffer)/p poly-Si heterojunctions fabricated by the electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD) method. The thin amorphous buffer layer played an important role in improving the photovoltaic performance. The optimization of the buffer layer thickness resulted in a conversion efficiency of eta =15.4% under AM1 solar simulated radiation of 100 mW/cm/sup 2/.<>
Keywords :
amorphous semiconductors; elemental semiconductors; hydrogen; p-n heterojunctions; plasma CVD; semiconductor materials; silicon; silicon compounds; solar cells; 15.4 percent; 300 C; AM1 solar simulated radiation; SiC:H-SiC:H-Si; amorphous SiC:H buffer layer; buffer layer thickness; conversion efficiency; high efficiency solar cells; low temperature processing; microcrystalline SiC:H; photovoltaic performance; polycrystalline Si; thin amorphous buffer layer; Amorphous materials; Buffer layers; Cyclotrons; Electrons; Heterojunctions; Photovoltaic cells; Plasma chemistry; Plasma materials processing; Plasma temperature; Resonance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.119189
Filename :
119189
Link To Document :
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