DocumentCode :
1174010
Title :
Scaling of characteristic frequencies in RF CMOS
Author :
Boots, Henk M.J. ; Doornbos, Gerben ; Heringa, Anco
Volume :
51
Issue :
12
fYear :
2004
Firstpage :
2102
Lastpage :
2108
Abstract :
Device simulation of the 180-, 90-, and 65-nm CMOS generations shows that in NMOSTs, the cut-off frequency fT and the maximum oscillation frequency fmax are roughly inversely proportional to the gate length. The voltage-gain bandwidth fA depends only weakly on the gate length. At 40-nm gate length, fT values of 300 GHz are predicted. For small values of the drain and source contact resistance (<10-8 Ω·cm2), fT can only be improved by a further reduction of the gate length. The fmax values (for zero gate resistance higher than fT) degrade strongly with increasing gate resistance. Simple approximate formulas for the dependence of fT and fA on the contact resistances are presented.
Keywords :
CMOS integrated circuits; radiofrequency integrated circuits; 180 nm; 300 GHz; 40 nm; 65 nm; 90 nm; NMOST; RF CMOS; cut-off frequency; device simulation; drain resistance; gate length; maximum oscillation frequency; source contact resistance; voltage-gain bandwidth; zero gate resistance; Bandwidth; CMOS technology; Capacitance; Contact resistance; Cutoff frequency; Degradation; Medical simulation; Predictive models; Radio frequency; Voltage; 65; Cut-off frequency; RF CMOS; TCAD; maximum oscillation frequency;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2004.838449
Filename :
1362974
Link To Document :
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