• DocumentCode
    1174602
  • Title

    Intersubband absorption at λ ∼ 2.1 μm in A-plane GaN/AlN multiple quantum wells

  • Author

    Gmachl, C. ; Ng, Hock M.

  • Author_Institution
    Lucent Technol. Bell Labs., Murray Hill, NJ, USA
  • Volume
    39
  • Issue
    6
  • fYear
    2003
  • fDate
    3/20/2003 12:00:00 AM
  • Firstpage
    567
  • Lastpage
    569
  • Abstract
    Intersubband optical absorption at λ ∼ 2.1 μm wavelength in doped 17.5 Å wide GaN quantum wells (QWs) with 51 Å wide intermediate AlN barriers is reported. A ∼600 nm thick GaN template and 15 QWs have been grown by molecular beam epitaxy on R-plane sapphire substrate and display pure A-plane orientation. QWs with A-plane orientation are essentially free from spontaneous polarisation, which is expected to greatly simplify the design of GaN/Al(Ga)N devices employing intersubband transitions.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; light absorption; molecular beam epitaxial growth; semiconductor quantum wells; wide band gap semiconductors; 2.1 micron; A-plane orientation; Al2O3; GaN-AlN; GaN/AlN multiple quantum well; R-plane sapphire substrate; intersubband optical absorption; molecular beam epitaxy;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20030381
  • Filename
    1192237