DocumentCode
1175258
Title
Threshold Voltage of Ultrathin Gate-Insulator MOSFETs
Author
Shih, Chun-Hsing ; Wang, Jhong-Sheng
Author_Institution
Dept. of Electr. Eng., Yuan Ze Univ., Taoyuan
Volume
30
Issue
3
fYear
2009
fDate
3/1/2009 12:00:00 AM
Firstpage
278
Lastpage
281
Abstract
This letter elucidates the difficulties in applying the conventional 2psiB threshold voltage model for current MOSFETs with ultrathin gate insulator and presents a new comprehensive alternative for general MOSFETs. After high-k gate dielectric is successfully developed to acquire a strong gate control, the on-off switching of MOSFETs is no longer dependent on substrate doping concentration as before. A physical drift-current threshold voltage model is proposed directly from the drain current itself, where the threshold voltage is defined as the onset of the drift current playing the main contribution in the total drain current. It can properly predict threshold voltage for general MOSFET devices and appropriately provide a physical current criterion for extracting the threshold voltage.
Keywords
MOSFET; semiconductor device models; 2psiB threshold voltage model; MOSFET; drift-current threshold voltage model; high-k gate dielectric; ultrathin gate-insulator; Dielectric substrates; Dielectrics and electrical insulation; Doping; Fluctuations; MOSFETs; Region 1; Semiconductor process modeling; Silicon; Surface fitting; Threshold voltage; Diffusion current; MOSFET; drift current; threshold voltage; ultrathin gate insulator;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2008.2011292
Filename
4787235
Link To Document