• DocumentCode
    1175258
  • Title

    Threshold Voltage of Ultrathin Gate-Insulator MOSFETs

  • Author

    Shih, Chun-Hsing ; Wang, Jhong-Sheng

  • Author_Institution
    Dept. of Electr. Eng., Yuan Ze Univ., Taoyuan
  • Volume
    30
  • Issue
    3
  • fYear
    2009
  • fDate
    3/1/2009 12:00:00 AM
  • Firstpage
    278
  • Lastpage
    281
  • Abstract
    This letter elucidates the difficulties in applying the conventional 2psiB threshold voltage model for current MOSFETs with ultrathin gate insulator and presents a new comprehensive alternative for general MOSFETs. After high-k gate dielectric is successfully developed to acquire a strong gate control, the on-off switching of MOSFETs is no longer dependent on substrate doping concentration as before. A physical drift-current threshold voltage model is proposed directly from the drain current itself, where the threshold voltage is defined as the onset of the drift current playing the main contribution in the total drain current. It can properly predict threshold voltage for general MOSFET devices and appropriately provide a physical current criterion for extracting the threshold voltage.
  • Keywords
    MOSFET; semiconductor device models; 2psiB threshold voltage model; MOSFET; drift-current threshold voltage model; high-k gate dielectric; ultrathin gate-insulator; Dielectric substrates; Dielectrics and electrical insulation; Doping; Fluctuations; MOSFETs; Region 1; Semiconductor process modeling; Silicon; Surface fitting; Threshold voltage; Diffusion current; MOSFET; drift current; threshold voltage; ultrathin gate insulator;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2008.2011292
  • Filename
    4787235