Title :
Vacuum arc deposition of carbon thin films in a low pressure of hydrogen
Author :
De Azevedo, Mario Douyon ; Meunier, Jean-Luc
Author_Institution :
Dept. of Chem. Eng., McGill Univ., Montreal, Que., Canada
fDate :
10/1/1991 12:00:00 AM
Abstract :
Results on the vacuum arc deposition (VAD) of thin carbon films on silicon, tungsten, and nickel are presented for different hydrogen pressures in the arc chamber. Raman and Auger electron spectroscopy and SEM analysis show that a large variety of film structures can be obtained. Highly oriented pyrolytic graphite is formed at high hydrogen pressure and low substrate temperature. Vacuum deposition resulted in a diamondlike structure. Evidence of the presence of multicrystalline spheres of diamond in some films is also presented
Keywords :
Auger effect; Raman spectra of inorganic solids; arcs (electric); carbon; discharges (electric); plasma deposition; scanning electron microscope examination of materials; Auger electron spectroscopy; Cu thin films; H; Ni; Raman spectroscopy; SEM analysis; Si; W; arc chamber; diamond; diamondlike structure; film structures; highly oriented pyrolytic graphite; low pressure; multicrystalline spheres; scanning electron microscopy; vacuum arc deposition; Electrons; Hydrogen; Nickel; Raman scattering; Semiconductor films; Silicon; Spectroscopy; Sputtering; Tungsten; Vacuum arcs;
Journal_Title :
Plasma Science, IEEE Transactions on
