DocumentCode :
1176064
Title :
Radiation damage of amorphous silicon photodiode sensors
Author :
Boudry, J.M. ; Antonuk, L.E.
Author_Institution :
Dept. of Radiat. Oncology, Michigan Univ., Ann Arbor, MI, USA
Volume :
41
Issue :
4
fYear :
1994
fDate :
8/1/1994 12:00:00 AM
Firstpage :
703
Lastpage :
707
Abstract :
The effect of 60Co radiation on the leakage current behavior of hydrogenated amorphous silicon photodiode sensors has been investigated. These sensors, with an n-i-p construction, are identical to those used on two-dimensional, pixelated imaging arrays currently under development. Sensor leakage current is reported as a function of dose up to a cumulative dose of ~3×106 cGy. Following the irradiation, the effect of room-temperature annealing on the leakage current was quantitatively studied. Finally, sensor noise measurements prior to and after the irradiation are also reported. The implications of this study for radiotherapy imaging are discussed
Keywords :
gamma-ray effects; semiconductor counters; Si:H; amorphous Si photodiode sensors; leakage current behavior; n-i-p construction; pixelated imaging arrays; radiotherapy imaging; room-temperature annealing; sensor leakage current; Amorphous silicon; Annealing; Chemical sensors; FETs; Image sensors; Leakage current; Photodiodes; Pixel; Sensor arrays; X-ray imaging;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.322792
Filename :
322792
Link To Document :
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