Technological sources of charged particles with plasma emitters

Author

Bugaev, S.P.

Author_Institution

High Current Electron. Inst., Acad. of Sci. Tomsk, USSR

Volume

19

Issue

5

fYear

1991

fDate

10/1/1991 12:00:00 AM

Firstpage

743

Lastpage

745

Abstract

At present, ion and electron beams, extensively used in industry, usually have a small cross section. Presented are generators of ion and electron flows with a large cross section using plasma emitters. These devices have a wide range of currents and voltages and are designed for metallurgical treatment and microelectronics. The author discusses a technological source of ions based on the vacuum-arc excited by a constricted discharge electron-beam installation with a large cross-section beam for microelectronics technology, a high-power electron-energy complex for heat treatment of manufactured articles and a generator of a low-energy, high-current electron beam with a plasma anode

Keywords

arcs (electric); discharges (electric); particle sources; plasma devices; arc excitation; charged particles; constricted discharge electron-beam installation; cross section; currents; electron beams; generators; heat treatment; high-power electron-energy complex; ion beams; manufactured articles; metallurgical treatment; microelectronics; plasma anode; plasma emitters; technological devices; vacuum-arc; voltages; Electron beams; Electron emission; Fault location; Microelectronics; Particle beams; Plasma applications; Plasma devices; Plasma sources; Vacuum technology; Voltage;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.108408

Filename

108408