Title :
Microstrip gas chambers on glass and ceramic substrates
Author :
Gong, W.G. ; Wieman, H. ; Harris, J.W. ; Mitchell, J.T. ; Hong, W.S. ; Perez-Mendez, V.
Author_Institution :
Div. of Nucl. Sci., Lawrence Berkeley Lab., CA, USA
fDate :
8/1/1994 12:00:00 AM
Abstract :
We report developments of microstrip gas chambers (MSGC) fabricated on glass and ceramic substrates with various resistivities. Low resistivity of the substrate is found to be critical for achieving stable operation of microstrip gas chambers. The microstrip pattern consists of 10 μm wide anodes and 90 μm wide cathodes with a 200 μm anode-to-anode pitch. High-quality microstrips are fabricated using the dry etch after UV-photolithography. Our chambers are tested in an Ar(90)-CH4(10) gas mixture at atmospheric pressure with a 100 μCi 55Fe source. An energy resolution (FWHM) of 15% has been achieved for 6 keV soft X-rays. At a rate of 5×104 photons/sec/mm2, gas gains are stable within a few percent
Keywords :
X-ray detection and measurement; position sensitive particle detectors; proportional counters; 0.0001 Ci; 6 keV; 55Fe source; Ar; Ar+methane gas mixture; Fe; UV-photolithography; atmospheric pressure; ceramic substrates; dry etch; energy resolution; glass substrates; low resistivity; microstrip gas chambers; microstrip pattern; soft X-rays; stable operation; Anodes; Cathodes; Ceramics; Conductivity; Dry etching; Energy resolution; Glass; Iron; Microstrip; Testing;
Journal_Title :
Nuclear Science, IEEE Transactions on
