Microstrip gas chambers on glass and ceramic substrates

Author

Gong, W.G. ; Wieman, H. ; Harris, J.W. ; Mitchell, J.T. ; Hong, W.S. ; Perez-Mendez, V.

Author_Institution

Div. of Nucl. Sci., Lawrence Berkeley Lab., CA, USA

Volume

41

Issue

4

fYear

1994

fDate

8/1/1994 12:00:00 AM

Firstpage

890

Lastpage

897

Abstract

We report developments of microstrip gas chambers (MSGC) fabricated on glass and ceramic substrates with various resistivities. Low resistivity of the substrate is found to be critical for achieving stable operation of microstrip gas chambers. The microstrip pattern consists of 10 μm wide anodes and 90 μm wide cathodes with a 200 μm anode-to-anode pitch. High-quality microstrips are fabricated using the dry etch after UV-photolithography. Our chambers are tested in an Ar(90)-CH₄(10) gas mixture at atmospheric pressure with a 100 μCi ⁵⁵Fe source. An energy resolution (FWHM) of 15% has been achieved for 6 keV soft X-rays. At a rate of 5×10⁴ photons/sec/mm², gas gains are stable within a few percent

Keywords

X-ray detection and measurement; position sensitive particle detectors; proportional counters; 0.0001 Ci; 6 keV; ⁵⁵Fe source; Ar; Ar+methane gas mixture; Fe; UV-photolithography; atmospheric pressure; ceramic substrates; dry etch; energy resolution; glass substrates; low resistivity; microstrip gas chambers; microstrip pattern; soft X-rays; stable operation; Anodes; Cathodes; Ceramics; Conductivity; Dry etching; Energy resolution; Glass; Iron; Microstrip; Testing;

fLanguage

English

Journal_Title

Nuclear Science, IEEE Transactions on

Publisher

ieee

ISSN

0018-9499

Type

jour

DOI

10.1109/23.322827

Filename

322827