• DocumentCode
    1176545
  • Title

    Investigation of plasma opening switch conduction and opening mechanisms

  • Author

    Weber, Bruce V. ; Commisso, Robert J. ; Goodrich, Phillip J. ; Grossmann, John M. ; Hinshelwood, David D. ; Kellogg, James C. ; Ottinger, Paul F.

  • Author_Institution
    US Naval Res. Lab., Washington, DC, USA
  • Volume
    19
  • Issue
    5
  • fYear
    1991
  • fDate
    10/1/1991 12:00:00 AM
  • Firstpage
    757
  • Lastpage
    766
  • Abstract
    Plasma opening switch techniques have been developed for pulsed power applications to exploit the advantages of electrical energy storage in a vacuum inductor compared to conventional, capacitive-based energy storage. Experiments are described that demonstrate the successful application of these techniques in conduction time ranges from 50 ns to over 1 μs. Physics understanding of the conduction and opening mechanisms is far from complete; however, many insights have been gained from experiments and theory. Measurements of current distribution, plasma density, and ion emission indicate that conduction and opening mechanisms differ for the 50 ns and 1 μs conduction times. For the 50 ns conduction time case, switching begins at a current level close to the bipolar emission limit, and opening could occur primarily by erosion. In the 1 μs conduction time case, limited hydrodynamic plasma displacement implies far higher plasma density than is required by the bipolar emission limit. Magnetic pressure is required to augment erosion to generate the switch gap inferred from experiments
  • Keywords
    inductive energy storage; plasma switches; plasma transport processes; pulsed power technology; 50 ns to 1 mus; bipolar emission limit; conduction; current distribution; electrical energy storage; erosion; ion emission; limited hydrodynamic plasma displacement; magnetic pressure; opening mechanisms; plasma density; plasma opening switch; pulsed power applications; vacuum inductor; Current measurement; Density measurement; Elementary particle vacuum; Energy storage; Inductors; Physics; Plasma applications; Plasma density; Switches; Vacuum technology;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.108411
  • Filename
    108411