DocumentCode
1176545
Title
Investigation of plasma opening switch conduction and opening mechanisms
Author
Weber, Bruce V. ; Commisso, Robert J. ; Goodrich, Phillip J. ; Grossmann, John M. ; Hinshelwood, David D. ; Kellogg, James C. ; Ottinger, Paul F.
Author_Institution
US Naval Res. Lab., Washington, DC, USA
Volume
19
Issue
5
fYear
1991
fDate
10/1/1991 12:00:00 AM
Firstpage
757
Lastpage
766
Abstract
Plasma opening switch techniques have been developed for pulsed power applications to exploit the advantages of electrical energy storage in a vacuum inductor compared to conventional, capacitive-based energy storage. Experiments are described that demonstrate the successful application of these techniques in conduction time ranges from 50 ns to over 1 μs. Physics understanding of the conduction and opening mechanisms is far from complete; however, many insights have been gained from experiments and theory. Measurements of current distribution, plasma density, and ion emission indicate that conduction and opening mechanisms differ for the 50 ns and 1 μs conduction times. For the 50 ns conduction time case, switching begins at a current level close to the bipolar emission limit, and opening could occur primarily by erosion. In the 1 μs conduction time case, limited hydrodynamic plasma displacement implies far higher plasma density than is required by the bipolar emission limit. Magnetic pressure is required to augment erosion to generate the switch gap inferred from experiments
Keywords
inductive energy storage; plasma switches; plasma transport processes; pulsed power technology; 50 ns to 1 mus; bipolar emission limit; conduction; current distribution; electrical energy storage; erosion; ion emission; limited hydrodynamic plasma displacement; magnetic pressure; opening mechanisms; plasma density; plasma opening switch; pulsed power applications; vacuum inductor; Current measurement; Density measurement; Elementary particle vacuum; Energy storage; Inductors; Physics; Plasma applications; Plasma density; Switches; Vacuum technology;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.108411
Filename
108411
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