DocumentCode
1177144
Title
A Refractive INdex Gradient (RING) diagnostic for transient discharges or expansions of vapor or plasmas
Author
Cuneo, Michael E. ; Lockner, Thomas R. ; Tisone, Gary C.
Author_Institution
Sandia Nat Labs., Albuquerque, NM, USA
Volume
19
Issue
5
fYear
1991
fDate
10/1/1991 12:00:00 AM
Firstpage
800
Lastpage
813
Abstract
The refractive index gradient (RING) diagnostic described uses a fast, silicon, photodiode quadrant detector with a differential amplifier to temporally detect the refraction of a CW laser by transient discharges or expansions of vapor, gas, or plasma. The method is a local one-dimensional time-resolved, quantitative, species-discriminating (i.e., atoms or electrons) Schlieren technique. The diagnostic is easy to field, sensitive (the minimum deflection angles detectable are ≈0.3 μrad), and fast (risetime=11±1 ns). Circuit design, performance, and diagnostic theory are discussed. To illustrate the utility of this technique, examples of measurements on LEVIS (laser evaporation ion source), a laser-produced, active, lithium ion source, are given. Measured properties include vapor/plasma production thresholds, expansion velocities, and time-resolved gradient and density spatial profiles. Comparisons of the RING results with measurements using a Faraday cup and a double-floating Langmuir probe are presented
Keywords
optical variables measurement; plasma diagnostics; refractive index; schlieren systems; CW laser; LEVIS; Li ion source; Si photodiode quadrant detector; circuit design; deflection angles; diagnostic; differential amplifier; expansions; fast system; gas; laser evaporation ion source; local one-dimensional time-resolved quantitative Schlieren technique; plasmas; refraction; refractive index gradient; risetime; species discrimination; transient discharges; vapor; vapour production; Differential amplifiers; Ion sources; Laser theory; Photodiodes; Plasma diagnostics; Plasma measurements; Plasma properties; Refractive index; Ring lasers; Silicon;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.108417
Filename
108417
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