Title :
Modal dispersion and attenuation measurements of silicon nitride and silicon oxynitride waveguides using a streak camera
Author :
May, Paul ; Basu, S. ; Chiu, George L. ; Arjavalingam, G.
Author_Institution :
IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
fDate :
2/1/1990 12:00:00 AM
Abstract :
By measuring short pulse propagation in silicon nitride and oxynitride waveguides fabricated on silicon, it has been possible to characterize both attenuation and group velocity dispersion accurately for the different modes that propagate. The method is self-calibrating, using the ratio between scattered light from forward and backward traveling pulses at a particular point on the waveguide. In principle, the group velocity data can be used to calculate the phase velocities for the different modes using known dispersion relations. The phase velocities were measured independently using a prism coupling technique, and the group velocities that could be derived from them matched the experimental data within a few percent. The resolution of the technique is limited mainly by amplitude fluctuations of the laser. The full-width-half-maximum resolution was at best about 12 ps but should be extendable to better than 5 ps
Keywords :
optical dispersion; optical loss measurement; optical testing; optical waveguides; silicon compounds; streak photography; Si; SiN; SiOxNy; attenuation; group velocity dispersion; laser amplitude fluctuations; phase velocities; prism coupling technique; resolution; short pulse propagation; streak camera; Attenuation measurement; Dispersion; Light scattering; Optical attenuators; Optical propagation; Phase measurement; Pulse measurements; Silicon; Velocity measurement; Waveguide components;
Journal_Title :
Lightwave Technology, Journal of