Title :
Implanted silicon JFET on completely depleted high-resistivity devices
Author :
Radeka, Veljko ; Rahek, P. ; Rescia, S. ; Gatti, Emilio ; Longoni, A. ; Sampietro, M. ; Bertuccio, G. ; Holl, P. ; Strüder, L. ; Kemmer, J.
Author_Institution :
Brookhaven Nat. Lab., Upton, NY, USA
Abstract :
To satisfy the increasing interest in the integration of electronics onto optical and ionizing particle fully depleted detectors, a nonconventional JFET (junction field-effect transistor), designed to operate on a completely depleted, 2-k Omega -cm resistivity silicon substrate, has been designed, fabricated, and tested at room temperature. The devices show very low gate leakage current, low output conductance, a transconductance per unit gate width of 3 mS/mm, and a pinch-off voltage of -1.5 V. The integration of the devices onto the detectors makes possible the matching of the input capacitance of the JFET to the detector´s output capacitance, which is of the order of few hundreds of femtorads. The measured gate capacitance of 200 fF is shown to correspond to an expected resolution in charge measurements, at room temperature, of less than 40 electrons rms. The fabrication constraints, imposed by the limited number of production steps of the detectors, are reported.<>
Keywords :
ion implantation; junction gate field effect transistors; particle detectors; semiconductor counters; -1.5 V; 200 fF; 3 mS; I-V characteristics; JFET; Si substrate; capacitance matching; charge measurements; completely depleted high-resistivity devices; fabrication constraints; gate capacitance; gate leakage current; ion implantation; output conductance; particle detectors; pinch-off voltage; resolution; transconductance per unit gate width; Capacitance; Charge measurement; Detectors; Electronic equipment testing; FETs; Integrated optics; Leak detection; Optical design; Silicon; Ultrafast optics;
Journal_Title :
Electron Device Letters, IEEE