• DocumentCode
    1179795
  • Title

    Two-dimensional energy-dependent models for the simulation of substrate current in submicron MOSFET´s

  • Author

    Agostinelli, V. Martin, Jr. ; Bordelon, T. James ; Wang, Xiaolin ; Hasnat, Khaled ; Yeap, Choh-Fei ; Lemersal, D.B., Jr. ; Tasch, Al F. ; Maziar, Christine M.

  • Author_Institution
    Intel Corp., Aloha, OR, USA
  • Volume
    41
  • Issue
    10
  • fYear
    1994
  • fDate
    10/1/1994 12:00:00 AM
  • Firstpage
    1784
  • Lastpage
    1795
  • Abstract
    Two-dimensional energy-dependent substrate current models are described for NMOS and PMOS devices that have been developed using a multi-contour approach. The new models offer a significant improvement in the calculation of substrate current due to a more accurate calculation of the average energy as compared to the local-field model. The models are implemented in a post-processing manner by applying a one-dimensional energy conservation equation to each of many current contours in order to generate a two-dimensional representation of average energy and impact ionization rate, that is then integrated to calculate the substrate current. The new models have been compared to substrate current characteristics of a variety of NMOS and PMOS devices for a wide range of bias conditions and channel lengths, and very good agreement has been obtained with a single set of model parameters. An additional significance of this work is the enhancement of the standard multi-contour model by an energy-sink term that results in an improved prediction of the impact ionization process in PMOSFET´s
  • Keywords
    hot carriers; impact ionisation; insulated gate field effect transistors; reliability; semiconductor device models; bias conditions; channel lengths; energy-sink term; impact ionization rate; multi-contour approach; one-dimensional energy conservation equation; submicron MOSFETs; substrate current; two-dimensional energy-dependent models; two-dimensional representation; Energy conservation; Equations; Hot carriers; Impact ionization; Interface states; MOS devices; MOSFET circuits; Predictive models; Steady-state; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.324589
  • Filename
    324589