DocumentCode
1179795
Title
Two-dimensional energy-dependent models for the simulation of substrate current in submicron MOSFET´s
Author
Agostinelli, V. Martin, Jr. ; Bordelon, T. James ; Wang, Xiaolin ; Hasnat, Khaled ; Yeap, Choh-Fei ; Lemersal, D.B., Jr. ; Tasch, Al F. ; Maziar, Christine M.
Author_Institution
Intel Corp., Aloha, OR, USA
Volume
41
Issue
10
fYear
1994
fDate
10/1/1994 12:00:00 AM
Firstpage
1784
Lastpage
1795
Abstract
Two-dimensional energy-dependent substrate current models are described for NMOS and PMOS devices that have been developed using a multi-contour approach. The new models offer a significant improvement in the calculation of substrate current due to a more accurate calculation of the average energy as compared to the local-field model. The models are implemented in a post-processing manner by applying a one-dimensional energy conservation equation to each of many current contours in order to generate a two-dimensional representation of average energy and impact ionization rate, that is then integrated to calculate the substrate current. The new models have been compared to substrate current characteristics of a variety of NMOS and PMOS devices for a wide range of bias conditions and channel lengths, and very good agreement has been obtained with a single set of model parameters. An additional significance of this work is the enhancement of the standard multi-contour model by an energy-sink term that results in an improved prediction of the impact ionization process in PMOSFET´s
Keywords
hot carriers; impact ionisation; insulated gate field effect transistors; reliability; semiconductor device models; bias conditions; channel lengths; energy-sink term; impact ionization rate; multi-contour approach; one-dimensional energy conservation equation; submicron MOSFETs; substrate current; two-dimensional energy-dependent models; two-dimensional representation; Energy conservation; Equations; Hot carriers; Impact ionization; Interface states; MOS devices; MOSFET circuits; Predictive models; Steady-state; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.324589
Filename
324589
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