• DocumentCode
    1180564
  • Title

    Piezoelectric Coefficients of Thin Film Aluminum Nitride Characterizations Using Capacitance Measurements

  • Author

    Al Ahmad, Mahmoud ; Plana, Robert

  • Author_Institution
    LAAS-CNRS, Univ. of Toulouse, Toulouse
  • Volume
    19
  • Issue
    3
  • fYear
    2009
  • fDate
    3/1/2009 12:00:00 AM
  • Firstpage
    140
  • Lastpage
    142
  • Abstract
    Piezoelectric materials have become very useful in MEMS devices because of their electrical-mechanical reciprocity. Aluminum nitride has attracted considerable attention in recent years owing to its unique properties. Here we report for the determination of aluminum nitride (AlN) piezoelectric thin film charge constants. When voltage is applied, the AlN film geometrical dimensions will change. The proposed technique does this determination by taking the ratio of parallel plate capacitance for two different bias conditions under set of assumptions in deriving the equations for the ratio of capacitance for the two bias conditions.
  • Keywords
    III-V semiconductors; aluminium compounds; capacitance; piezoelectric semiconductors; piezoelectric thin films; semiconductor thin films; wide band gap semiconductors; AlN; capacitance; charge constants; parallel plate capacitance ratio; piezoelectric coefficients; piezoelectric thin film; Aluminum nitride (AIN); characterizations; dimensional variation; material parameters; piezoelectric material;
  • fLanguage
    English
  • Journal_Title
    Microwave and Wireless Components Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1531-1309
  • Type

    jour

  • DOI
    10.1109/LMWC.2009.2013682
  • Filename
    4796220