DocumentCode :
1180564
Title :
Piezoelectric Coefficients of Thin Film Aluminum Nitride Characterizations Using Capacitance Measurements
Author :
Al Ahmad, Mahmoud ; Plana, Robert
Author_Institution :
LAAS-CNRS, Univ. of Toulouse, Toulouse
Volume :
19
Issue :
3
fYear :
2009
fDate :
3/1/2009 12:00:00 AM
Firstpage :
140
Lastpage :
142
Abstract :
Piezoelectric materials have become very useful in MEMS devices because of their electrical-mechanical reciprocity. Aluminum nitride has attracted considerable attention in recent years owing to its unique properties. Here we report for the determination of aluminum nitride (AlN) piezoelectric thin film charge constants. When voltage is applied, the AlN film geometrical dimensions will change. The proposed technique does this determination by taking the ratio of parallel plate capacitance for two different bias conditions under set of assumptions in deriving the equations for the ratio of capacitance for the two bias conditions.
Keywords :
III-V semiconductors; aluminium compounds; capacitance; piezoelectric semiconductors; piezoelectric thin films; semiconductor thin films; wide band gap semiconductors; AlN; capacitance; charge constants; parallel plate capacitance ratio; piezoelectric coefficients; piezoelectric thin film; Aluminum nitride (AIN); characterizations; dimensional variation; material parameters; piezoelectric material;
fLanguage :
English
Journal_Title :
Microwave and Wireless Components Letters, IEEE
Publisher :
ieee
ISSN :
1531-1309
Type :
jour
DOI :
10.1109/LMWC.2009.2013682
Filename :
4796220
Link To Document :
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