DocumentCode :
1181662
Title :
How to Control AFM Nanoxerography for the Templated Monolayered Assembly of 2 nm Colloidal Gold Nanoparticles
Author :
Ressier, Laurence ; Palleau, Etienne ; Garcia, Cecile ; Viau, Guillaume ; Viallet, Benoit
Author_Institution :
Centre Nat. de la Rech. Sci. (CNRS), Univ. of Toulouse, Toulouse, France
Volume :
8
Issue :
4
fYear :
2009
fDate :
7/1/2009 12:00:00 AM
Firstpage :
487
Lastpage :
491
Abstract :
This paper reports on the directed monolayered assembly of 2 nm colloidal gold nanoparticles onto charge patterns written by atomic force microscopy (AFM) on poly(methylmethacrylate) thin films with a sub-100-nm spatial resolution. The impact of key experimental parameters (surface potential of charge patterns, immersion time in the colloidal solution, nanoparticle concentration, rinsing time) on the nanoparticle assembly was quantified for the first time. This study reveals that the high level of control of this so-called AFM nanoxerography process will allow one to construct promising colloid-based devices integrating localized nanoparticle monolayers of desired density.
Keywords :
atomic force microscopy; colloids; gold; monolayers; nanoparticles; polymer films; surface potential; Au; atomic force microscopy nanoxerography; charge patterns; colloidal nanoparticles; poly(methylmethacrylate) thin films; size 2 nm; surface potential; Atomic force microscopy (AFM); Kelvin force microscopy (KFM); colloidal nanoparticles; directed assembly; electrostatic nanopatterning;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2009.2016089
Filename :
4796319
Link To Document :
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