• DocumentCode
    1182461
  • Title

    Direct UV writing of buried singlemode channel waveguides in Ge-doped silica films

  • Author

    Svalgaard, M. ; Poulsen, C.V. ; Bjarklev, A. ; Poulsen, Ole

  • Author_Institution
    Microelectronics Center, Tech. Univ. Denmark, Lyngby
  • Volume
    30
  • Issue
    17
  • fYear
    1994
  • fDate
    8/18/1994 12:00:00 AM
  • Firstpage
    1401
  • Lastpage
    1403
  • Abstract
    Germanosilicate film waveguides fabricated by plasma enhanced chemical vapour deposition have been shown to possess high sensitivity towards UV induced index changes. As an illustration of possible future applications, direct point-to-point writing of buried singlemode channel waveguides using a focused, continuous wave, UV laser beam is demonstrated
  • Keywords
    germanium; integrated optics; laser beam applications; optical films; optical waveguides; optical workshop techniques; plasma CVD coatings; silicon compounds; Ge-doped silica films; SiO2:Ge; buried singlemode channel waveguides; direct UV writing; focused continuous wave UV laser beam; germanosilicate film waveguides; plasma enhanced chemical vapour deposition; point-to-point writing; refractive index;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19940935
  • Filename
    326318
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1182461