DocumentCode :
118250
Title :
Influence of Cu orientation on the growth of Cu-Sn intermetallics and interfacial reaction of Cu/Sn diffusion couple
Author :
Shan Yang ; Li Peng ; Yishi Tao ; Anmin Hu ; Ming Li
Author_Institution :
Sch. of Mater. Sci. & Eng., Shanghai Jiao Tong Univ., Shanghai, China
fYear :
2014
fDate :
12-15 Aug. 2014
Firstpage :
121
Lastpage :
124
Abstract :
The copper substrates with different preferred orientations (200) and (220) were prepared and the interfacial reactions of the Cu(200)/Sn and Cu(220)/Sn diffusion couples were studied after annealing at 423K. The thickness and morphology of the intermetallic compounds were investigated. The appearance of the Cu3Sn was observed at Cu(220)/Sn interface after aged for 4 hours and then the thickness of Cu3Sn grown quickly. There is less Cu3Sn at Cu(200)/Sn interface but the Cu6Sn5 grown quickly and quantities of voids gathered into cracks. The preferred orientations of the Cu substrates are believed to be the reasons of the different interfacial reactions phenomena.
Keywords :
annealing; chemical reactions; copper alloys; diffusion; integrated circuit packaging; solders; tin alloys; Cu-Sn; annealing; couple diffusion; interfacial reaction phenomena; intermetallic compound morphology; intermetallic compound thickness; intermetallic growth; temperature 423 K; time 4 hour; voids; Aging; Annealing; Copper; Crystals; Morphology; Substrates; Tin; electroplate; interfacial reactions; orientation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology (ICEPT), 2014 15th International Conference on
Conference_Location :
Chengdu
Type :
conf
DOI :
10.1109/ICEPT.2014.6922618
Filename :
6922618
Link To Document :
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