DocumentCode :
1182940
Title :
Improvement in the optical quality of GaInNAs/GaInAs quantum well structures by interfacial strain reduction
Author :
Navaretti, P. ; Liu, H.Y. ; Hopkinson, M. ; Rrez, M. Gutié ; David, J.P.R. ; Hill, G. ; Herrera, M. ; Lez, D. Gonzá ; García, R.
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. of Sheffield, UK
Volume :
151
Issue :
5
fYear :
2004
Firstpage :
301
Lastpage :
304
Abstract :
The authors report on the use of thin (2 nm) layers with intermediate strain placed between the barriers and the quantum wells of GaInNAs/GaInNAs structures in order to reduce the effect of strain on the quantum wells. A comparison between samples with and without these strain-mediating layers has been performed using various optical and structural techniques, such as photoluminescence, high-resolution X-ray diffractometry and transmission electron microscopy. The results show that the introduction of strain-mediating layers brings beneficial effects to the structural quality of the active region which, in turn, is reflected by a two orders of magnitude improvement in the photoluminescence intensity. It is thought that this structural design approach can be successfully used to obtain high performance 1.3 and 1.55 μm lasers based on dilute nitride materials grown on GaAs.
Keywords :
III-V semiconductors; X-ray diffraction; gallium compounds; indium compounds; photoluminescence; semiconductor quantum wells; transmission electron microscopy; wide band gap semiconductors; GaInNAs-GaInNAs; GaInNAs/GaInAs quantum well structures; X-ray diffractometry; dilute nitride materials; interfacial strain reduction; photoluminescence; transmission electron microscopy;
fLanguage :
English
Journal_Title :
Optoelectronics, IEE Proceedings -
Publisher :
iet
ISSN :
1350-2433
Type :
jour
DOI :
10.1049/ip-opt:20040934
Filename :
1367373
Link To Document :
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