Title :
Preparation of silver nanosheets used for low temperature bonding
Author :
Yunwen Wu ; Fengtian Hu ; Anming Hu ; Ming Li
Author_Institution :
State Key Lab. of Metal Matrix Composites, Key Lab. for Thin Film & Microfabrication Technol. of the Minist. of Educ., Shanghai Jiao Tong Univ., Shanghai, China
Abstract :
A simple electroless deposition method of fabricating silver nanosheets which is a promising replacement for a high-temperature lead-rich solder used for electronics has been reported. This substrate free deposition method can solve the surface coating problem of the nanostructured silver. By controlling the deposition time, the silver nanosheets with a length of 2μm and a width ranging from 10nm to 20nm have been selected due to its relative large surface area and high uniformity. The relatively high surface energy of nanostructured silver results in a melting point depression. About 1 μm high Cu micro cones are used to bond with the silver nanosheets. After room temperature bonding with the assistance of a constant pressure of 10kPa, the bonded sample was put in the oven to be heated to accumulate the diffusion between the two metals. More crystal information of the silver nanosheets has also been provided by X-ray diffraction analysis (XRD) and transmission electron microscope analysis (TEM) respectively. As silver has high electrical and thermal conductivities, this silver nanosheets has potential applications as conducting interconnectors and tracks in printed circuit boards.
Keywords :
X-ray diffraction; copper alloys; electrical conductivity; electroless deposition; high-temperature techniques; integrated circuit bonding; nanofabrication; nanostructured materials; sheet materials; silver alloys; solders; thermal conductivity; three-dimensional integrated circuits; transmission electron microscopy; Cu; TEM; X-ray diffraction analysis; XRD; conducting interconnectors; constant pressure; crystal information; high copper microcones; high electrical conductivity; high surface energy; high-temperature lead-rich solder; low temperature bonding; melting point depression; nanostructured silver; pressure 10 kPa; printed circuit boards; relative large surface area; room temperature bonding; silver nanosheet fabrication; silver nanosheet preparation; simple electroless deposition method; size 10 nm to 20 nm; size 2 mum; substrate free deposition method; surface coating problem; temperature 293 K to 298 K; thermal conductivity; three-dimensional integration; transmission electron microscope analysis; Bonding; Copper; Films; Silver; Substrates; Surface treatment; electroless deposition; low-temperature bonding; nanostructured silver;
Conference_Titel :
Electronic Packaging Technology (ICEPT), 2014 15th International Conference on
Conference_Location :
Chengdu
DOI :
10.1109/ICEPT.2014.6922663