DocumentCode :
1183627
Title :
Fabrication of nanoscale device using individual colloidal gold nanoparticles
Author :
Khondaker, S.I.
Author_Institution :
Centre for Nano, Univ. of Texas, Austin, TX, USA
Volume :
151
Issue :
5
fYear :
2004
Firstpage :
457
Lastpage :
460
Abstract :
A simple technique is presented for the fabrication of nanoscale devices. Commercially available bare gold colloidal nanoparticles are first trapped between two prefabricated large gap electrodes to form a metallic bridge by the application of an AC electric field. The nanoparticle bridge is then broken by slowly ramping a DC voltage across the junction until the current drops to zero. This simple, highly reliable and reproducible technique consistently produces metallic electrodes with less than 10 nm gap and can be applied to prefabricated electrodes up to 1 μm separation. The nanogaps created are ideally suited to contacting individual nanostructures. The paper describes an electrical transport study of a thiol coated 3 nm gold nanoparticle that shows a clear Coulomb staircase.
Keywords :
colloids; electrodes; gold; nanoelectronics; nanoparticles; AC electric field; Coulomb staircase; DC voltage; colloidal gold nanoparticles; electrical transport; large gap electrodes; metallic bridge; metallic electrodes; nanogaps; nanoparticle bridge; nanoscale device fabrication; nanostructures;
fLanguage :
English
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
Publisher :
iet
ISSN :
1350-2409
Type :
jour
DOI :
10.1049/ip-cds:20040957
Filename :
1367444
Link To Document :
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